Scanning probe Microscopy |
In air&liquid: AFM (contact + semi-contact + non-contact) / Lateral Force Microscopy / Phase Imaging/ Force Modulation/ Adhesion Force Imaging/ Lithography: AFM (Force) In air only: STM/ Magnetic Force Microscopy/ Electrostatic Force Microscopy/ Scanning Capacitance Microscopy/ Kelvin Probe Microscopy/ Spreading Resistance Imaging/ Lithography: AFM (Current), STM/ AFAM (optional) |
Specification |
Scan type |
Scanning by sample |
Scanning by probe* |
Sample size |
Up to 40 mm in diameter, to 15 mm in height |
Up to 100 mm in diameter, up to 15 mm in height |
Sample weight |
Up to 100 g |
Up to 300 g |
XY sample positiniong range |
5x5 mm |
Positioning resolution |
Readable resolution -5 um
Sensitivity -2 um |
Scan range |
100x100x10 um
3x3x2,6 um |
100x100x10 um
50x50x5 um |
Up to 200x200x20 um**(DualScan™mode) |
Non linearity, XY
(with closed loop sensors) |
≤ 0.1% |
≤ 0.15% |
Noise level, Z
(RMS in bandwidth 1000Hz) |
With sensors |
0.04 nm (typically),
≤ 0.06 nm |
0.06 nm (typically),
≤ 0.07 nm |
Without sensors |
0.03 nm |
0.05 nm |
Noise level, XY***
(RMS in bandwidth 200Hz) |
With sensors |
0.2 nm (typically),
≤ 03 nm (XY 100 um) |
0.1 nm (typically),
≤ 0.2 nm (XY 50 um) |
Without sensors |
0.02 nm (XY 100 um),
0.001 nm (XY 3 um) |
0.01 nm (XY 50 um) |
Linear dimension estimation error (with sensors) |
±0.5% |
±1.2% |
Optical viewing system |
Optical resolution |
1 um (0.4 um optional, NA 0.7)**** |
3 um |
Field of view |
4.5 - 0.4 mm |
2.0 - 0.4 mm |
Continuous zoom |
Available |
Available |
Vibration isolation |
Active |
0.7-1000 Hz |
Passive |
Above 1 kHz |
* Scanning head can be configured to serve as a stand-alone device for specimens of unlimited sizes.
** Optionally can be expanded to 200x200x20 m.
*** Built-in capacitive sensors have extremely low noise and any area down to 50x50 nm can be scanned with closed-loop control.
**** High Resolution Viewing system (HRV head) is optional and provides additional functionality making it possible to generate and detect tip-localized aperture less near-field effects.